China's major technical equipment industry has achieved a new breakthrough.

Recently, China's chip industry has ushered in a new dawn - argon fluoride lithography machine. According to the latest "Guidance Catalogue for the Promotion and Application of the First (Set) Major Technical Equipment (2024 Edition)" issued by the Ministry of Industry and Information Technology, domestic argon fluoride lithography machines have made significant progress. As a key equipment for integrated circuit production, its core advantage lies in its light source wavelength of 193 nanometers, which can achieve resolution below 65 nanometers and overlay accuracy below 8 nanometers. The achievement of this technical indicator means that Chinese chip manufacturers will be able to use more advanced and accurate domestic equipment for high-precision chip manufacturing, thereby greatly improving the performance and reliability of chips. The birth of this groundbreaking technology not only marks a major leap in China's semiconductor manufacturing equipment field, but also lays a solid foundation for the independent control and technological upgrading of China's chip industry.